Detail-oriented Plasma and Laser Physics Engineer with PhD background in Physics and Materials Science, supported by 10 years of research and development work experience in Physics and Chemistry of Materials.
2 years of experience
Competence Lead - Particle Control - ASML Netherlands
Defectivity and Particle Control - Multi-beam Electron Microscopy tools
Root cause analysis (RCA)
System Failure Mode and Effective Analysis (FMEA)
Machine learning and Data analysis
Tool qualifications and Supply quality
4 years of experience
Thin-film deposition for the surface protection and degradation protection;
In-depth materials characterization before and after plasma processing;
Industrial customers: Toyota-Europe, NWO institutes;
4 years of experience
Materials developments: Vacuum thin films deposition by Plasma-ALD,
Pulsed laser deposition (PLD), PECVD, CVD, and Sputtering.
Process developments: Photolithography, laser lithography, and e-beam
lithography; Dry (wet) chemical etching, Surface chemistry.
Computing: Statistics: Matlab, Origin pro, 3ds max and blender.
Reactive ion etching (RIE) of thin films by Ar plasma, Cl, and other chemistries;
Plasma enhanced CVD of SiO2 and SiN thin films and characterization;
Marie-Curie Research Fellow 2022
Australian Endeavor Research Fellow, 2014
Two significant US patents and International Journals – 40, Citations – 1500;